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Tantalum Powder
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Ta Powder
Spherical tantalum powder is prepared by the plasma rotary electrode atomization process. It has a high sphericity and low oxygen content, which solves the problem that metal tantalum implants are easily brittle due to high oxygen content, and greatly reduces production costs. In the case of ensuring quality, our production costs are greatly reduced. As a medical metal powder, it has good biocompatibility and is used by medical 3D printing manufacturing companies as a key research and development metal powder material, it in medical implant, spraying, laser cladding, electronic product and surface coating.
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0-25um
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15-45um
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20-60um
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45-105um
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45-150um
Element
TA
Fe
Nb
Ni
Si
Ti
Mo
W
O
Standard
Bal
<0.001
0.01
<0.001
<0.001
0.003
<0.001
0.008
0.002
PSD
0-20um, 15-45um, 20-60um, 45-105um, 45-150um
Purity
0.9999
Sphericity
>95%
Oxygen Content
<100ppm
Fluidity
7.55/50g
Bulk Density
9.3g/cm3
Tap Density
9.8g/cm3
Standard
​ASTM B348, ASTM F136, ASTM F1580, ASTM F2924, ASTM F3001, AMS 1498
Particle Size Distribution Tantalum Powder
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Particle size distribution is measured by laser diffraction as per ASTM B822. Due to the Almost no satellite powder and hollow powder, high sphericity with excellent fluidity, low oxygen content on AM Co., Ltd. powder, the particle size distribution is highly uniform and the D10, D50 and D90 meet and exceed the industry requirements with an exceptional batch to batch reliability. The typical powder of plasma rotary electrode atomized process yield ranges from 0-150 µm, after atomization, the powder is sieved according customer specifications.

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