Tantalum Powder
Ta Powder
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Spherical tantalum powder is prepared by the plasma rotary electrode atomization process. It has a high sphericity and low oxygen content, which solves the problem that metal tantalum implants are easily brittle due to high oxygen content, and greatly reduces production costs. In the case of ensuring quality, our production costs are greatly reduced. As a medical metal powder, it has good biocompatibility and is used by medical 3D printing manufacturing companies as a key research and development metal powder material, it in medical implant, spraying, laser cladding, electronic product and surface coating.
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20-60um
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45-105um
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45-150um
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Element |
TA |
Fe |
Nb |
Ni |
Si |
Ti |
Mo |
W |
O |
Standard |
Bal |
<0.001 |
0.01 |
<0.001 |
<0.001 |
0.003 |
<0.001 |
0.008 |
0.002 |
PSD |
0-20um, 15-45um, 20-60um, 45-105um, 45-150um |
Purity |
0.9999 |
Sphericity |
>95% |
Oxygen Content |
<100ppm |
Fluidity |
7.55/50g |
Bulk Density |
9.3g/cm3 |
Tap Density |
9.8g/cm3 |
Standard |
ASTM B348, ASTM F136, ASTM F1580, ASTM F2924, ASTM F3001, AMS 1498 |
Particle Size Distribution Tantalum Powder
Particle size distribution is measured by laser diffraction as per ASTM B822. Due to the Almost no satellite powder and hollow powder, high sphericity with excellent fluidity, low oxygen content on AM Co., Ltd. powder, the particle size distribution is highly uniform and the D10, D50 and D90 meet and exceed the industry requirements with an exceptional batch to batch reliability. The typical powder of plasma rotary electrode atomized process yield ranges from 0-150 µm, after atomization, the powder is sieved according customer specifications.